A taper thread is applied to straight body, effectively dispersing stress at the top of implant. Threads have higher depth in the apical portion and then decreases gradually into the platform. This design improves blood supply and lessees the empty space in cortical bone to reduce time of bone formation.
The longer the implant length, the longer the straight body. Therefore, long implant can be placed stably without arousing sudden changes during surgery as in straight implant.
Perfect connection abutment and fixture is guaranteed. Impact on the fixture is reduced and bone loss is minimized.
During placement of the fixture, it can be placed deep without additional drilling by minimizing resistance.
Self-tapping is maximized by sharp edge.
Sand blast with large grit and acid etching.
Embodiment of optimal morphology and roughness with excellent osseointegration performance. The low surface roughness reduces adhesion and proliferation of bacteria and minimizes peri-implantitis. Friction in the cortical bone is minimized and concern for bone heating is reduced. With this technology, DIO Implant System offers fast osseointegration and long-term stability.
UF II Master Kit is composed of drills with outstanding cutting force and durability. It is usable for the DIO Implant fixtures such as UF (II) Narrow Ø3.0 Ø3.3, UF (II) Regular Ø3.8 Ø4.0 Ø4.5 Ø5.0.
UF II Wide Kit is composed of drills with outstanding cutting force and durability. It is usable for the DIO Implant fixtures such as UF (II) Wide Ø6.0 Ø6.5 Ø7.0.